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Proceedings Paper

Laser Fabrication Of Interconnect Structures On CMOS Gate Arrays
Author(s): John C. Whitehead; Fred Mitlitsky; David J. Ashkenas; Anthony F. Bernhardt; Steven E. Farmwald; James L. Kaschmitter; Bruce M. McWilliams
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Paper Abstract

Maskless, automated, five minute interconnection of 1000 gate CMOS array die has been accomplished using discretionary laser-induced chemical vapor deposition. Eight 125-stage ring oscillators written on single CMOS gate array die were shown to have the device-limited performance of similar patterns manufactured by photolithographically patterned aluminum-silicon alloy. These results suggest the feasibility of using this method, Laser Pantography (LP), for rapid implementation of prototype and limited volume semicustom VLSI circuits immediately after their design is completed.

Paper Details

Date Published: 5 August 1986
PDF: 9 pages
Proc. SPIE 0621, Manufacturing Applications of Lasers, (5 August 1986); doi: 10.1117/12.961147
Show Author Affiliations
John C. Whitehead, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
Fred Mitlitsky, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
David J. Ashkenas, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
Anthony F. Bernhardt, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
Steven E. Farmwald, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
James L. Kaschmitter, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)
Bruce M. McWilliams, U.S. Department of Energy by Lawrence Livermore National Laboratory (United States)


Published in SPIE Proceedings Vol. 0621:
Manufacturing Applications of Lasers
Peter K. Cheo, Editor(s)

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