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Proceedings Paper

A-Si Photoreceptors At The Threshold Of Industrial Application
Author(s): W. Senske; N. Marschall
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Paper Abstract

A-Si has become an attractive alternative for conventional electrophotographic photoreceptors. A-Si photoreceptors have been prepared by other laboratories by plasma deposition with blocking and protection layers. These photoreceptors are highly photosensitive and show low fatigue. Using sputtering we have shown that this technique is capable of produc-ing films with high charge acceptance. The increase of the deposition rate is presently un-der intensive investigation. High rates can be achieved by a higher degree of silane decomposition or by magnetron sputtering together with a higher power level. Deposition rates of more than 20 pm/h have been obtained by both techniques.

Paper Details

Date Published: 12 March 1986
PDF: 7 pages
Proc. SPIE 0617, Amorphous Semiconductors for Microelectronics, (12 March 1986); doi: 10.1117/12.961078
Show Author Affiliations
W. Senske, AEG-Forschungsinstitut (FRG)
N. Marschall, AEG-Forschungsinstitut (FRG)

Published in SPIE Proceedings Vol. 0617:
Amorphous Semiconductors for Microelectronics
David Adler, Editor(s)

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