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Proceedings Paper

A Deep UV Imaging System For Lithography And Process Development
Author(s): Paul Michaloski; Paul Dewa
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Paper Abstract

A simple optical imaging system has been designed and built for printing sub-half-micron lithographic images at 248 nm. The following discusses the design considerations of producing a system that can achieve the optical and mechanical criteria of microlithography while still maintaining the simplicity and versatility for a research and development instrument. Also, discussed are designs of lenses that perform at other UV wavelengths and mount in the same mechanical system as the 248 nm lens.

Paper Details

Date Published: 16 December 1988
PDF: 5 pages
Proc. SPIE 0998, Excimer Beam Applications, (16 December 1988); doi: 10.1117/12.960207
Show Author Affiliations
Paul Michaloski, GCA/Tropel (United States)
Paul Dewa, GCA/Tropel (United States)


Published in SPIE Proceedings Vol. 0998:
Excimer Beam Applications
Anthony N. Pirri; Bernhard P. Piwczyk, Editor(s)

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