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Proceedings Paper

Fabrication Of Ti:LiNbO3 Optical Channel Waveguides Using A Rapid Thermal Annealing System
Author(s): Daryl C. Cromer; Gregory N. De Brabander; Joseph T. Boyd; Howard E. Jackson; S. Sriram
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Paper Abstract

We have investigated use of rapid thermal annealing (RTA) to initiate in-diffusion of Ti into LiNb03 to form optical channel waveguides using several different RTA processes. Each process is characterized by a different RTA temperature versus time variation followed by a common furnace heating step. One set of samples has undergone a slow ramp RTA temperature versus time variation, a second set has undergone a two step variation, a third set has undergone a very rapid ramp, and a fourth set has undergone no RTA processing. Samples processed with the fast RTA ramp of temperature versus time to 875C yielded the lowest channel waveguide propagation loss of about 1 dB/cm measured at a wavelength of 632.8 nm.

Paper Details

Date Published: 6 December 1988
PDF: 5 pages
Proc. SPIE 0993, Integrated Optical Circuit Engineering VI, (6 December 1988); doi: 10.1117/12.960067
Show Author Affiliations
Daryl C. Cromer, University of Cincinnati (United States)
Gregory N. De Brabander, University of Cincinnati (United States)
Joseph T. Boyd, University of Cincinnati (United States)
Howard E. Jackson, University of Cincinnati (United States)
S. Sriram, Battelle Columbus Laboratories (United States)

Published in SPIE Proceedings Vol. 0993:
Integrated Optical Circuit Engineering VI
Mark A. Mentzer, Editor(s)

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