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Proceedings Paper

High Resolution Lens System For Submicron Photolithography
Author(s): Anthony R. Phillips; M. John Buzawa
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Paper Abstract

New technology in the field of integrated circuits has created a demand for photolithographic projection lenses capable of producing submicron line structures. Tropel has introduced a series of UV Micro Tropar objectives for this specific application.These lenses achieve their superior performance by utilizing the 365nm line and increasing the numerical aperture to 0.40. Optical design considerations in the development of these lenses included appropriate materials selection, field vs. aperture tradeoffs, telecentricity constraints, and partial coherence effects due to underfill of the lens pupil. Manufacturing problems are accentuated by the extremely tight tolerances on all of the construction parameters of the lens system. Special interferometric test equipment, used to provide precise measurements of each lens element, has proven to be indispensable in the fabrication of these objectives. Mounting of these elements on a common optical axis is an absolute necessity if the ultimate resolution of the design is to be achieved. Testing of these lenses is also a challenge due to the high spatial frequencies involved and limitations on visual examination of the image. Methods of circumventing these difficulties will be discussed. Typical MTF test results and performance data will be presented.

Paper Details

Date Published: 16 September 1980
PDF: 9 pages
Proc. SPIE 0237, 1980 International Lens Design Conference, (16 September 1980); doi: 10.1117/12.959100
Show Author Affiliations
Anthony R. Phillips, Coherent, Inc. (United States)
M. John Buzawa, Coherent, Inc. (United States)


Published in SPIE Proceedings Vol. 0237:
1980 International Lens Design Conference
Robert E. Fischer, Editor(s)

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