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Proceedings Paper

Design And Fabrication Of Microelectronic Lenses
Author(s): R. E. Tibbetts; J. S. Wilczynski
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Paper Abstract

Programs written to assist in the design and evaluation of microelectronic lenses are briefly described. Over the past 15 years, several families of lenses were designed using these programs. Basically, the higher order aberrations are mapped for a series of similar designs with corrected Seidel aberrations. The OTF program is used to guide the final stages of design. Two lens structures are described that a fully automatic program could not produce. The last section deals with the practical aspects of making lens elements, mechanical assembly, and testing completed objectives.

Paper Details

Date Published: 16 September 1980
PDF: 8 pages
Proc. SPIE 0237, 1980 International Lens Design Conference, (16 September 1980); doi: 10.1117/12.959099
Show Author Affiliations
R. E. Tibbetts, T. J. Watson Research Center (United States)
J. S. Wilczynski, T. J. Watson Research Center (United States)


Published in SPIE Proceedings Vol. 0237:
1980 International Lens Design Conference
Robert E. Fischer, Editor(s)

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