Share Email Print
cover

Proceedings Paper

Goal-Oriented Process Tuning
Author(s): Mary L. Long; Michael A. Schmidt
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Following a decade of rapidly shrinking linewidths, semiconductor microlithography stopped short of the predicted one micron level and hovered for most of the 1970's at five microns (or 0.2 mils). By 1979, various developments in equipment, materials and processing allowed the downward trend to be resumed. The gap between five microns and one micron appears to be closing rapidly, with micron and sub-micron lithography again being predicted for high volume manufacturing.

Paper Details

Date Published: 5 September 1980
PDF: 7 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958639
Show Author Affiliations
Mary L. Long, KTI Chemicals, Incorporated/Texas Division (United States)
Michael A. Schmidt, Motorola, Incorporated/Semiconductor Research and Development Labs (United States)


Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

© SPIE. Terms of Use
Back to Top