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Proceedings Paper

A Comparison Of Silver Halide Systems As Applied To Today's Advanced Semiconductor Requirements
Author(s): Paul H. Johnson; David L. Angel
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Paper Abstract

An extensive evaluation has been run on the current state of emulsion plates as applicable to the semiconductor industry. Analyses include direct comparisons of different available manufacturers of silver halide light sensitive systems and their ability to produce a viable product applicable to photo-masking. The parameters tested include control of critical dimensions and defects. The test procedure includes optimized and specified processes for each product and associated limitations in speed, safelight effect, image structure and quality and latent image decay. The parameters of optimized use are also investigated and discussed. Tests include imaging from conlact exposure with both normal and reversal processing.

Paper Details

Date Published: 5 September 1980
PDF: 19 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958636
Show Author Affiliations
Paul H. Johnson, American Microsystems, Inc. (United States)
David L. Angel, American Microsystems, Inc. (United States)


Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

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