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Proceedings Paper

Practical Aspects Of Automatic Mask Inspection
Author(s): Richard P. Speck
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Paper Abstract

This paper evaluates a number of factors relevant to the mask manufacturer or user considering automatic mask inspection equipment. The emphasis is on inspection of ordinary production masks and mask blanks although extension of the design concepts to meet future VLSI needs is also considered. The performance of a commercial automatic mask inspection system which follows these design concepts is reviewed and related to the users objectives.

Paper Details

Date Published: 5 September 1980
PDF: 5 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958633
Show Author Affiliations
Richard P. Speck, Spectron Instrument Corporation (United States)

Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

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