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Proceedings Paper

Macroelectronic Photolithography: I�The Optimization Of Photoresist Application By Roller Coating
Author(s): R. A. Bond; H. M. Naguib
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Paper Abstract

Macroelectronic photolithography is an extension of conventional photolithographic processes to produce high resolution patterning of thin film integrated circuits over large area substrates. Such patterns are needed in fabricating the addressing circuitry for flat panel liquid crystal displays. The first important step in macroelectronic photolithography involves the development of reliable large area coating processes for photoresist materials. This paper deals with the optimization of the roller coating process for Shipley AZ-1350 J positive photoresist to achieve a resolution of 4 μm line widths and spacings extended and distributed over 10 cm x 10 cm glass substrates. Resist viscosity, doctor bar pressure and roller/substrate interference level were investigated to achieve resist thickness uniformity of ±0.1 μm; this variation in resist thickness would cause a variation of ±0.6 μm in line width. Other problems associated with the photofabrication of thin film macrocircuits are discussed. These include mask preparation, inspection and etching processes. Anticipated solutions to these problems are briefly outlined.

Paper Details

Date Published: 5 September 1980
PDF: 10 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958627
Show Author Affiliations
R. A. Bond, Bell-Northern Research (Canada)
H. M. Naguib, Bell-Northern Research (Canada)


Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

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