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Proceedings Paper

Characterization of Al-Si Plasma Etching And Its Affect On Metal Oxide Semiconductor (MOS) Electrical Parameters
Author(s): Barry LeBeau; Bob Wourms
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Paper Abstract

Aluminum plus Silicon alloys were etched using a four step process in a planar parallel plate plasma reactor. Chlorine based gas mixtures are used for a rapid etch of the aluminum and a fluorine based gas mixture is used to remove the residual silicon. Wafers patterned with positive and negative photoresists and an etch stop layer of silicon dioxide were used to produce 16K n-channel MOS memory devices. The wafers were processed in a split lot experiment using plasma processing and standard wet chemical etching. Working devices fabricated with these processes were electrically tested. SEM photographs show the resist degradation and the resulting alloy edge profile.

Paper Details

Date Published: 5 September 1980
PDF: 3 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958625
Show Author Affiliations
Barry LeBeau, National Semiconductor Corporation (United States)
Bob Wourms, National Semiconductor Corporation (United States)


Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

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