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Proceedings Paper

Shape-dependent dose margin correction using model-based mask data preparation
Author(s): Yasuki Kimura; Ryuuji Yamamoto; Takao Kubota; Kenji Kouno; Shohei Matsushita; Kazuyuki Hagiwara; Daisuke Hara
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Paper Abstract

Dose Margin has always been known to be a critical factor in mask making. This paper describes why the issue is far more critical than ever before with the 20-nm logic node and beyond using ArF Immersion lithography. Model-Based Mask Data Preparation (MB-MDP) had been presented [references] to show shot count improvements for these complex masks. This paper describes that MBMDP also improves the dose margin. The improvement predicted with theoretical simulation with D2S is confirmed by the results of real mask written by JBX-3200MV (JEOL) by HOYA.

Paper Details

Date Published: 8 November 2012
PDF: 9 pages
Proc. SPIE 8522, Photomask Technology 2012, 85221I (8 November 2012); doi: 10.1117/12.958601
Show Author Affiliations
Yasuki Kimura, HOYA Corp. (Japan)
Ryuuji Yamamoto, HOYA Corp. (Japan)
Takao Kubota, HOYA Corp. (Japan)
Kenji Kouno, HOYA Corp. (Japan)
Shohei Matsushita, D2S K.K. (Japan)
Kazuyuki Hagiwara, D2S K.K. (Japan)
Daisuke Hara, D2S K.K. (Japan)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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