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Proceedings Paper

Photomask Mensuration With The Linear Microdensitometer
Author(s): Burton D. Figler
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Paper Abstract

Recent improvements to the Aerodyne Linear Microdensitometer have enabled the attainment of ensurational accuracies of 0.025-microns. This accuracy, coupled with optical resolution capabilities of 0.5 to 1.0-microns, permits computerized photomask inspection that allows submicron defect detection with outstanding mensurational accuracy. For photomask line widths on the order of 1-micron, mensurational accuracies of better than 5% of the line width are thus achieved.

Paper Details

Date Published: 28 May 1980
PDF: 7 pages
Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); doi: 10.1117/12.958588
Show Author Affiliations
Burton D. Figler, Aerodyne Research, Inc. (United States)


Published in SPIE Proceedings Vol. 0220:
Optics in Metrology and Quality Assurance
Harvey L. Kasdan, Editor(s)

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