Share Email Print

Proceedings Paper

Microdensitometer Measurements Of Photomask Quality
Author(s): David Kryger
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The need for fast, objective, and accurate measurement of several aspects of photomasks is clear. Photomask technology, on a production basis, is rapidly approaching the 1 pm geometries. In doing so, current automated inspection equipment becomes of limited usefulness. The following is a discussion of measurements made using a microdensitometer. These measurements are intended to show that the basis for an instrument that is capable of increasing high resolution measurements does exist.

Paper Details

Date Published: 28 May 1980
PDF: 7 pages
Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); doi: 10.1117/12.958587
Show Author Affiliations
David Kryger, Aerodyne Research, Inc. (United States)

Published in SPIE Proceedings Vol. 0220:
Optics in Metrology and Quality Assurance
Harvey L. Kasdan, Editor(s)

© SPIE. Terms of Use
Back to Top