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Proceedings Paper

Microdensitometer Measurements Of Photomask Quality
Author(s): David Kryger
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Paper Abstract

The need for fast, objective, and accurate measurement of several aspects of photomasks is clear. Photomask technology, on a production basis, is rapidly approaching the 1 pm geometries. In doing so, current automated inspection equipment becomes of limited usefulness. The following is a discussion of measurements made using a microdensitometer. These measurements are intended to show that the basis for an instrument that is capable of increasing high resolution measurements does exist.

Paper Details

Date Published: 28 May 1980
PDF: 7 pages
Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); doi: 10.1117/12.958587
Show Author Affiliations
David Kryger, Aerodyne Research, Inc. (United States)


Published in SPIE Proceedings Vol. 0220:
Optics in Metrology and Quality Assurance
Harvey L. Kasdan, Editor(s)

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