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Proceedings Paper

Blazed Holographic Gratings By Selective Etching In Silicon
Author(s): J. Muller; R. Nietz; U. Unrau
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Paper Abstract

Holographic exposure and selective etching in silicon are combined to fabricate high-precision gratings with nearly arbitrary blaze angle and flat surfaces. The process starts with commercially available silicon wafers, the surfaces of which are oriented at the desired angle to a {1 1 1} plane. Gratings between 0.5μm and 5 μm have been realized with holographic and mask exposure. Efficiencies up to 90% have been measured. Furthermore, simple tools for quick and high-precision alignment of the holographic equipment are described.

Paper Details

Date Published: 25 December 1979
PDF: 7 pages
Proc. SPIE 0192, Interferometry, (25 December 1979); doi: 10.1117/12.957865
Show Author Affiliations
J. Muller, Institut fur Hochfrequenztechnik der Technischen Universitat (Germany)
R. Nietz, Institut fur Hochfrequenztechnik der Technischen Universitat (Germany)
U. Unrau, Institut fur Hochfrequenztechnik der Technischen Universitat (Germany)


Published in SPIE Proceedings Vol. 0192:
Interferometry
George W. Hopkins, Editor(s)

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