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Proceedings Paper

High-Resolution Flatness-Testing Interferometer For 6-Inch Photoplates
Author(s): Charles Edward Synborski
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Paper Abstract

Strangely enough, many users of optical projection photolithography sometimes assume that their final process yield is more influenced by non-flat wafers than it is by crooked photoplates. This misconception is even more widespread when one is considering the larger wafers and photoplates in use. If you do not agree with this observation (or accusation), try to list the companies that offer wafer flatness analyzers for 5 inch wafers, for example. Virtually all manufacturers of wafer flatness testers sport 5 inch wafer test capability. Now try to name those companies that offer a 6 x 6 inch photomask flatness analyzer. Surely, if testing 5 inch wafers is important to you, then testing the corresponding 6 inch photomasks should also be important to you. I think you will find that although great interest and activity has been shown in the field of 5 inch wafer flatness and its effect on yield when used in conjunction with 1 : 1 projection or proximity printing, the lonely 6 inch photoplate has been forgotten. This fact is made more irrational when you consider the increased difficulties associated with manufacturing or obtaining "flat" 6 x 6 inch mask substrates. To fill this gap, Tropel recently introduced interferometers which are designed specifically to test the surface figures of large photoplates. This paper will describe the design, configuration and characteristics of this new flatness analyzer. A simple statistical evaluation of the machine's repeatability as well as the reproducability between two machines will be given.

Paper Details

Date Published: 17 July 1979
PDF: 10 pages
Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957190
Show Author Affiliations
Charles Edward Synborski, Tropel, Inc. (United States)

Published in SPIE Proceedings Vol. 0174:
Developments in Semiconductor Microlithography IV
James W. Dey, Editor(s)

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