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Proceedings Paper

Optical Measuring Technology Of The Micropatterns
Author(s): S. Yoshida; K. Nakazawa; A. Tanimoto
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Paper Abstract

This paper describes three optical measuring machines which have been recently developed for state-of-the-art microlithography, as follows: (1) X-Y measuring machine for checking photomask registration. Utilizing a photoelectric microscope and a laser interferometer, this machine has a repeatability of less than O.lμm, covering a measuring range of 6 inches. (2) Measuring machine for critical line width (1 - 100µm) of photomask. This machine likewise utilizes the latest photoelectric detection technology; it has a repeatability of approximately 0.05µm. (3) Measuring machine for wafer and photomask micropatterns. A newly developed system which makes use of laser beam technology is incorporated in this machine; measurement repeatability is approximately 0.05µm.

Paper Details

Date Published: 17 July 1979
PDF: 8 pages
Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957187
Show Author Affiliations
S. Yoshida, Nippon Kogaku K. K. (Nikon) (Japan)
K. Nakazawa, Nippon Kogaku K. K. (Nikon) (Japan)
A. Tanimoto, Nippon Kogaku K. K. (Nikon) (Japan)


Published in SPIE Proceedings Vol. 0174:
Developments in Semiconductor Microlithography IV
James W. Dey, Editor(s)

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