Share Email Print

Proceedings Paper

New Generation Of 1:1 Optical Projection Mask Aligners
Author(s): Michael C. King; Edward S. Muraski
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The increased density of today's VLSI circuits requires a tighter control at all semi-conductor processing parameters. Included is the need for improved lithography. This paper describes a new 1:1 projection mask aligner that uses ring-field reflective optics. Described are the improvements made in the optical design and fabrication, temperature control, vibration and alignment systems all of which are required to achieve a 2-micrometer production performance. The results of the improvements are presented in terms of lithography on resist-coated silicon wafers.

Paper Details

Date Published: 17 July 1979
PDF: 5 pages
Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957180
Show Author Affiliations
Michael C. King, Perkin-Elmer ICorporaton (United States)
Edward S. Muraski, Perkin-Elmer Corporaton (United States)

Published in SPIE Proceedings Vol. 0174:
Developments in Semiconductor Microlithography IV
James W. Dey, Editor(s)

© SPIE. Terms of Use
Back to Top