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Proceedings Paper

High-Precision Polishing With Polytron
Author(s): H. J. Juranek
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Paper Abstract

A special polishing pad is described which is very little known up to now. It was developed by CARL ZEISS some years ago it was named Polytron. General concept of Polytronpolishing is discussed and special examples of workshopapplications are given.

Paper Details

Date Published: 25 September 1979
PDF: 4 pages
Proc. SPIE 0163, Advances in Optical Production Technology II, (25 September 1979); doi: 10.1117/12.956909
Show Author Affiliations
H. J. Juranek, Laboratory for Optical Technology (West Germany)

Published in SPIE Proceedings Vol. 0163:
Advances in Optical Production Technology II

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