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Proceedings Paper

Influence of illumination mode to lithographic imaging
Author(s): Yong Liu; Tingwen Xing; Xiong Yang
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Paper Abstract

As resolution of lithography becomes narrower, the illumination mode affects imaging more significantly. Correct illumination mode can improve resolution. Element theorems of lithographic imaging have been presented. Polarized imaging and partially coherent imaging have been derived and simulated. The reason why illumination mode affects imaging is analyzed. The image contrast and depth of focus (DOF) under different polarizations and coherent factors are compared. The result shows that imaging performance can be improved by selecting correct mode of illumination.

Paper Details

Date Published: 15 October 2012
PDF: 7 pages
Proc. SPIE 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing, 84201C (15 October 2012); doi: 10.1117/12.956499
Show Author Affiliations
Yong Liu, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Tingwen Xing, Institute of Optics and Electronics (China)
Xiong Yang, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8420:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing
Xiangdi Lin; Yoshiharu Namba; Tingwen Xing, Editor(s)

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