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Proceedings Paper

Laser Fabrication Of Photomasks For Hybrid Circuits
Author(s): Robert T. Crowley
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Paper Abstract

This paper describes a technique for generating photomasks for hybrid circuits using a laser resistor trimming system. Photomasks can be generated by two separate techniques: micromachining a thin opaque film on a transparent substrate with a Nd:YAG laser, or exposing a photoresist covered blank photomask with an argon ion laser.

Paper Details

Date Published: 7 July 1986
PDF: 6 pages
Proc. SPIE 0611, Laser Processing of Semiconductors & Hybrids, (7 July 1986); doi: 10.1117/12.956408
Show Author Affiliations
Robert T. Crowley, Electro Scientific Industries, Inc. (United States)


Published in SPIE Proceedings Vol. 0611:
Laser Processing of Semiconductors & Hybrids
Edward J. Swenson, Editor(s)

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