Share Email Print

Proceedings Paper

Sputtering By Plasma-Enriched Deposition For Thin Film Applications
Author(s): George Garfield
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Since the introduction of commercial sputtering equipment in 1 964 both users and manufacturers have made significant, if not spectacular, contributions to the development of the technology. The Symposia cosponsored by Consolidated Vacuum Corporation and the University of Rochester in 1966, 1967 and 1969 represent a composite of most of the early work that was done. The earliest equipment configurations available and in use were D. C. in both the diode and triode modes. These were followed by the introduction of R. F. in both modes for the deposition of dielectric materials. Although applications work was initially undertaken by people in a number of industries, ultimately the greatest progress came from the microelectrics industry. While some applications work continued in the optical, decorative and solid film lubricants fields, the disadvantages of sputtering continued to outweigh its advantages. A number of unrelated events occurring over the last several years however, has created a new burst of interest and enthusiasm for sputtering as a thin film deposition technique. Magnetically enhanced sputtering is central to this vitalization. A brief review of the development of sputtering is followed by an indepth discussion of magnetically enhanced sputte ring; its advantages, disadvantages and application opportunities.

Paper Details

Date Published: 26 September 1978
PDF: 4 pages
Proc. SPIE 0140, Optical Coatings: Applications and Utilization II, (26 September 1978); doi: 10.1117/12.956278
Show Author Affiliations
George Garfield, CVC Products Inc. (United States)

Published in SPIE Proceedings Vol. 0140:
Optical Coatings: Applications and Utilization II
Gary W. DeBell; Douglas H. Harrison, Editor(s)

© SPIE. Terms of Use
Back to Top