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Proceedings Paper

Flow Technology For Pulsed Chemical Lasers
Author(s): W. J. Thayer; V. R. Buonadonna; W. D. Sherman; J. Doyle McClure
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Paper Abstract

This paper describes flow techniques developed recently for pulsed chemical laser applications. These techniques support development of a high power, repetitively pulsed DF chemical laser that has high beam quality and high mass flow utilization, and eliminate flow issues as major technical obstacles to such laser development. Three coupled flow problems are identified, and mutally compatible solutions to these problems are described. These problems are 1) extinguishing chemical reaction following each laser pulse (i.e. "flame-out") so that fresh D2-F2 mixture can flow into the cavity, 2) supplying a homogeneous reagent mixture with the required 99% individual species uniformity, and 3) rapid suppression and clearing of pressure disturbances produced by pulsed reaction to provide required density uniformity in the fresh mixture.

Paper Details

Date Published: 17 August 1978
PDF: 10 pages
Proc. SPIE 0138, Advances in Laser Technology III: Emphasizing Gaseous Lasers, (17 August 1978); doi: 10.1117/12.956217
Show Author Affiliations
W. J. Thayer, Boeing Aerospace Company (United States)
V. R. Buonadonna, Boeing Aerospace Company (United States)
W. D. Sherman, Boeing Aerospace Company (United States)
J. Doyle McClure, Boeing Aerospace Company (United States)


Published in SPIE Proceedings Vol. 0138:
Advances in Laser Technology III: Emphasizing Gaseous Lasers
David Finkleman; Joseph Stregack, Editor(s)

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