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Proceedings Paper

Empirical Statistics For Yield Map Analysis
Author(s): Peter S. Gwozdz
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Paper Abstract

Yield maps provide a powerful tool for the location and analysis of mask defects. The routine use of yield maps has not been widely accepted due to the requirement for involved statistical computations. Empirically justified approximations are derived for simple, quick yield map analysis. The physical significance of these approximations is discussed both graphically and heuristically.

Paper Details

Date Published: 6 September 1978
PDF: 4 pages
Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956126
Show Author Affiliations
Peter S. Gwozdz, Fairchild Camera and Instrument Corporation (United States)

Published in SPIE Proceedings Vol. 0135:
Developments in Semiconductor Microlithography III
Dino R. Ciarlo; James W. Dey; Ken Hoeppner, Editor(s)

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