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Proceedings Paper

One Micron Range Photoresist Imaging: A Practical Approach
Author(s): David J. Elliott; Mary Ann Hockey
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Paper Abstract

Submicron photoresist imaging technology is discussed in terms of its use in the production of semicon-ductor devices. Photoresist processing techniques necessary for one micron work are reviewed, and optimization techniques presented. Recent developments in semiconductor technology that contribute to sub-micron photolithography are covered, and all major process fabrication steps are reviewed. SEM's showing one micron range images in positive photoresist, along with parameters used to generate them, are presented. Finally, recommendations are made for establishing a one micron range photoresist imaging process.

Paper Details

Date Published: 6 September 1978
PDF: 17 pages
Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956123
Show Author Affiliations
David J. Elliott, Shipley Company Inc. (United States)
Mary Ann Hockey, Hughes Aircraft (United States)


Published in SPIE Proceedings Vol. 0135:
Developments in Semiconductor Microlithography III
Dino R. Ciarlo; James W. Dey; Ken Hoeppner, Editor(s)

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