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Proceedings Paper

Optical Problems Of Small Geometry Automatic Mask Inspection
Author(s): Kenneth A. Snow
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Paper Abstract

As geometry sizes decrease and mask sizes increase, the importance of high speed automatic mask inspection is increasingly evident. High speed scanning of large surfaces, while recording the location of artifacts less than 1/10 the size of a hair in less time than it takes to talk about it, presents some formidable problems for the optical architecture of the system.

Paper Details

Date Published: 6 September 1978
PDF: 8 pages
Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956118
Show Author Affiliations
Kenneth A. Snow, KLA Instruments Corporation (United States)

Published in SPIE Proceedings Vol. 0135:
Developments in Semiconductor Microlithography III
Dino R. Ciarlo; James W. Dey; Ken Hoeppner, Editor(s)

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