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Proceedings Paper

High Resolution Lithography Of Charge Coupled Devices (CCDS) Using Projection Printing
Author(s): Edgar D. Lancaster; F. Kub; J. Taylor
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Paper Abstract

A four phase transparent gate CCD has been fabricated using 1:1 projection printing on all photo-lithographic processes which required resist resolution in the 2-4 µm range on many of the masking levels. The photolithographic processes and techniques used will be described and presented.

Paper Details

Date Published: 6 September 1978
PDF: 6 pages
Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956107
Show Author Affiliations
Edgar D. Lancaster, Westinghouse Advanced Technology Laboratories (United States)
F. Kub, Westinghouse Advanced Technology Laboratories (United States)
J. Taylor, Westinghouse Advanced Technology Laboratories (United States)

Published in SPIE Proceedings Vol. 0135:
Developments in Semiconductor Microlithography III
Dino R. Ciarlo; James W. Dey; Ken Hoeppner, Editor(s)

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