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Proceedings Paper

Aspheric Generation By Sputtering Techniques
Author(s): Vic Bennett; Jack Smith
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Paper Abstract

A new method-of generating aspheric elements is discussed. In this method, the aspheric element is produced by sputtering a non-uniform, but radially symmetric. coatino onto the substrate. The desired non-uniformity is produced by selective masking of the substrate. As proof of the concept, an 8.25-inch diameter aspheric element was made. This asphere has a maximum departure from spherical of 84pm and a maximum slope deviation from spherical of 132µm/in. The finished sputtered asphere departed from the design asphere by 0.38µm.

Paper Details

Date Published: 21 November 1977
PDF: 7 pages
Proc. SPIE 0126, Clever Optics: Innovative Applications of Optics, (21 November 1977); doi: 10.1117/12.955892
Show Author Affiliations
Vic Bennett, Itek Corporation (United States)
Jack Smith, Itek Corporation (United States)


Published in SPIE Proceedings Vol. 0126:
Clever Optics: Innovative Applications of Optics
N. Balasubramanian; James C. Wyant, Editor(s)

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