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Proceedings Paper

Ion Imaging In Secondary Ion Mass Spectrometry
Author(s): Dale E. Newbury
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Paper Abstract

In the technique of analysis known as secondary ion mass spectrometry (SIMS), a beam of energetic ions (2-40 keV) strikes a sample(pd dislodges atoms lying near the surface by the process known as sputtering, Figure 1. A small fraction (104 - 10 2) of the sputtered sample atoms is emitted in a charged state, the so-called secondary ions. Because of their electrical charge, the secondary ions can be attracted by appropriate electrical fields into a mass spectrometer which disperses the ions according to their mass-to-charge ratio. Ion detection is accomplished by either an electrical detector or a photographic plate. By varying the strength of the magnetic and/or electrical field of the mass spectrometer, a mass spectrum of the positive or negative sputtered ions in the form of intensity versus mass-to-charge ratio is obtained.

Paper Details

Date Published: 26 August 1977
PDF: 5 pages
Proc. SPIE 0104, Multidisciplinary Microscopy, (26 August 1977); doi: 10.1117/12.955422
Show Author Affiliations
Dale E. Newbury, National Bureau of Standards (United States)

Published in SPIE Proceedings Vol. 0104:
Multidisciplinary Microscopy
Robert Whitman, Editor(s)

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