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Proceedings Paper

Reticles By Automatic Pattern Generation
Author(s): Gerald M. Henriksen
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Paper Abstract

The automatic production of reticles for semiconductor masks has become a well-established production technique using optical pattern generators. The important characteristics of these generators are defined and a comparison made of the types in general use today. The advantages and disadvantages of the optical and electron beam generators as related to reticle-making are defined and discussed. In a general overview of mask requirements, the characteristics of masks currently in use are related to the trends of the future.

Paper Details

Date Published: 8 August 1977
PDF: 10 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955358
Show Author Affiliations
Gerald M. Henriksen, Electromask, Inc., Subsidiary of THE Corporation (United States)


Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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