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Proceedings Paper

The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists
Author(s): Donald W. Frey
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Paper Abstract

The chemical nature of positive working photoresists is examined in the choice of various components and their effect on the practical performance characteristics. The contribution of several potential resist components, alone and in combination, is described.

Paper Details

Date Published: 8 August 1977
PDF: 1 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955354
Show Author Affiliations
Donald W. Frey, Eastman Kodak Company (United States)


Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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