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Proceedings Paper

Automatic Inspection Of Mask Defects
Author(s): Paul Sandland
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Paper Abstract

Semiconductor yield can be greatly affected by defective photomasks. Various methods of detection of photomask defects have been investigated in the past. This paper discusses some methods available for the detection of random defects and describes a newly developed automatic mask inspection system.

Paper Details

Date Published: 8 August 1977
PDF: 11 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955350
Show Author Affiliations
Paul Sandland, KLA Instruments Corporation (United States)


Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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