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Proceedings Paper

The Use Of An Automatic Mask Inspection System (AMIS) In Photomask Fabrication
Author(s): John G. Skinner
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Paper Abstract

This paper was prepared for presentation at the SPIE meeting, "Developments in Semiconductor Microlithography II", held in San Jose, California, April 4-5, 1977. Most photolithographic masks have defects, and one of the most difficult tasks of the mask maker is to locate and identify these defects. A knowledge of the size, type, and location of defects is needed not only to tell the wafer process area how good, or bad, the delivered masks are but also to help the mask shop make better masks. An Automatic Mask Inspection System (AMIS) has been in routine operation for measuring the defect count on various types of masks at Bell Laboratories, Murray Hill, N.J., since February, 1975. This talk will give a brief description of AMIS and will describe its use in photomask manufacture.

Paper Details

Date Published: 8 August 1977
PDF: 6 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955349
Show Author Affiliations
John G. Skinner, Bell Telephone Laboratories (United States)


Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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