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Proceedings Paper

Some Remarks About Linewidth Variations
Author(s): Hans R. Rottmann
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Paper Abstract

The aim of this work is to determine different types of contributions to dimensional errors so that appropriate and selective improvements can be undertaken toward optimization of the photolithographic process. Preliminary results are given on contributions by the resist, lens, and errors due to focus and exposure. Systematic variations below O.lμm were found in many instances.

Paper Details

Date Published: 8 August 1977
PDF: 8 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955348
Show Author Affiliations
Hans R. Rottmann, IBM System Products Division (United States)

Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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