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Proceedings Paper

Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics
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Paper Abstract

This manuscript presents a review of recent advances in EUV/x-ray substrate specification, fabrication and metrology for photolithography, synchrotron sources, free-electron laser sources, solar physics and astronomy. Highlights from ultra-low- expansion glass substrates, silicon and silicon carbide substrates are presented. Selected emerging substrate materials and fabrication technologies are also discussed.

Paper Details

Date Published: 15 October 2012
PDF: 9 pages
Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 850102 (15 October 2012); doi: 10.1117/12.954852
Show Author Affiliations
Regina Soufli, Lawrence Livermore National Lab. (United States)
Sherry L. Baker, Lawrence Livermore National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Tom McCarville, Lawrence Livermore National Lab. (United States)
Jeffrey C. Robinson, Lawrence Livermore National Lab. (United States)
Dennis Martínez-Galarce, Lockheed Martin Advanced Technology Ctr. (United States)
Mónica Fernández-Perea, Lawrence Livermore National Lab. (United States)
Michael J. Pivovaroff, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 8501:
Advances in Metrology for X-Ray and EUV Optics IV
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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