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Proceedings Paper

Photomask quality problems
Author(s): Reynold M. Shoho
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Paper Abstract

The problems associated with photomask production are categorized as follow:

Paper Details

Date Published: 20 September 1976
PDF: 2 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954849
Show Author Affiliations
Reynold M. Shoho, Rockwell International (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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