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Proceedings Paper

Mask Inspection - What's It Worth to You?
Author(s): Mel Wright
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Paper Abstract

How many times have you discussed the need for increased I.C. complexity, C.D.'s with tighter tolerances, submicron C.D.'s, zero defects, larger dies . . . ? Since each one of these needs will require additional mask inspection effort, I suggest that you should ask, "What is it worth to you and when does the cost of mask inspection approach the critical point of a depreciating return on investment (i.e. tooling cost versus die yield)?". It has been my experience that approximately one half of the labor used to fabricate masks is devoted to mask inspection. A survey of mask fabricators and mask users indicated the following ranking, in order of importance, of four mask quality parameters: (1) pattern registration (2) critical dimensions (measured with precision) (3) fatal defects (4) critical dimensions (measured with accuracy)

Paper Details

Date Published: 20 September 1976
PDF: 1 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954848
Show Author Affiliations
Mel Wright, Tektronix, Inc. (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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