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Proceedings Paper

New Approaches For High Repeatibility Mask Making And Mask Measuring
Author(s): Hans-Dieter Jacoby
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Paper Abstract

A step repeater and a mask measuring machine have been designed and tested. One of the important goals of the development for both machines was realising small repeatibility errors. For this purpose special principles in measuring techniques,in positioning systems and in design principles have been adheared which are being described, together with the concept of computer controll. For the measuring machine a newly developed two-coordinate photoelectric-microscope is being used as pick up. Repeatibility errors are for the step repeater 0,1 μm measured on different mask plates, and for the mask measuring machine o,o8 μm, 1 sigma value.

Paper Details

Date Published: 20 September 1976
PDF: 7 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954847
Show Author Affiliations
Hans-Dieter Jacoby, E. Leitz Wetzlar GmbH (Germany)


Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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