Share Email Print

Proceedings Paper

Photomask Inspection Techniques For Predicting And Maximizing LSI Yield
Author(s): Mary L. Long; Franklin L. Long
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The impact of mask quality on wafer yield can hardly be debated. Photomask quality can seriously limit wafer yield, but that limitation can be minimized by effective mask inspection and process control. Techniques for predicting mask limited yield will be presented in conjunction with a discussion of methods for maximizing yields through appropriate process controls.

Paper Details

Date Published: 20 September 1976
PDF: 5 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954845
Show Author Affiliations
Mary L. Long, Semiconductor Research and Development Laboratory (United States)
Franklin L. Long, Advanced Products Research and Development Laboratory (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

© SPIE. Terms of Use
Back to Top