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Proceedings Paper

The Effects Of Operating Parameters On Line-Width Measurements With An Optical Microscope
Author(s): Diana Nyyssonen; John M. Jerke
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Paper Abstract

A current micrometrology program at the National Bureau of Standards is concerned with the development of calibrated artifacts and accurate methods for line-width measurements in the 1 to 10 μm region with application to measurements of critical dimensions on IC photomasks. A major program objective is to develop improved theory and experimental verification for line-width measurements made with commonly used optical-microscope systems. Most line-width measurement techniques utilizing an optical microscope apply some edge detection criterion to the image profile. The measurement is therefore affected by system parameters which affect the image profile, such as defocus, spherical aberration and coherence of the illumination. The effects of some of these parameters have been treated previously in the literature. As examples, image profiles for incoherent, coherent, and partially coherent illumination are presented. Image profiles are also given for oaring amounts of defocus with and without spherical aberration. However, these curves only indicate trends and do not represent image profiles that would result with realistic values of the system parameters.

Paper Details

Date Published: 20 September 1976
PDF: 1 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954835
Show Author Affiliations
Diana Nyyssonen, National Bureau of Standards (United States)
John M. Jerke, National Bureau of Standards (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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