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Proceedings Paper

Evaluation Of Photomask Materials And Their Effect On Yield
Author(s): M. K. Stelter; K. H. Paterson
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Paper Abstract

Several viable photomask materials and processing systems are evaluated with regard to their defect contribution to the overall photolithographic yield. Practical results are compared with theoretical predictions.

Paper Details

Date Published: 20 September 1976
PDF: 7 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954833
Show Author Affiliations
M. K. Stelter, Photo Transfer Industries (United States)
K. H. Paterson, Zenith Radio Corporation (United States)


Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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