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Proceedings Paper

Improved Microphotographic Systems In The Semiconductor Industry
Author(s): H. Philippaerts; W. Vanassche; R. Duville
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Paper Abstract

Experimental work on a new photographic material and associated process technology. are described with reference to the requirements of the manufacturers of advanced micro electronic devices with high, packing density. The microphotographic process is demonstrated practically for contact printing in a negative situation as well as in a positive/positive situation. The capacity of the new microphotographic process to control accurately the initial dimensions on the micro-image is of great significance in order to define the geolletry of the device to be designed.

Paper Details

Date Published: 20 September 1976
PDF: 8 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954832
Show Author Affiliations
H. Philippaerts, R&D Laboraties (Belgium)
W. Vanassche, R&D Laboraties (Belgium)
R. Duville, R&D Laboraties (Belgium)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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