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Proceedings Paper

Artwork Mask Generation Of Convex/Concave Regions
Author(s): Larry Widigen
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Paper Abstract

The geometries of semiconductor photomasks often incorporate complex regions in the definition of diffusion windows. This paper presents a technique for the computer generation of the master artwork for such photomask patterns. Given the perimeter definition of a convex mask region, a general technique for filling in the region is developed. This technique is then extended to include any convex/concave shaped region. An algorithm that permits optimal photoplotter aperture selection is then introduced. Combining this algorithm with this general technique provides an effective method of automatic mask generation.

Paper Details

Date Published: 20 September 1976
PDF: 6 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954829
Show Author Affiliations
Larry Widigen, Texas Instruments Incorporated (United States)


Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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