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Proceedings Paper

Development Of Optical Measurement And Control Systems For Photolithography
Author(s): Gerald Bachur
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Paper Abstract

As the difficulties of producing more complicated integrated circuits increased, the pressures on process designers caused manufacturers of supporting technologies to develop the equipment necessary to generate reproducible product at reasonable yields. A group which proved highly successful in developing higher-performance equipment was in the optical measurement area. In fact, the generation of new measurement systems which were now highly reliable, repeatable, and traceable to NBS gave the device manufacturers a set of "measurement standards" which were rapidly accepted because of proven results. With the results being so positive, impetus was given toward the development of the optically-controlled systems needed to ensure highly-repeatable exposure cycles. A highly-significant advancement in process control, Constant Intensity, was developed. This system uses optical sensors to track the degradation of the source (in respect to specific photosensitive materials) and compensate for the wear by controlling power to the source, main-taining the desired intensity from exposure to exposure. The Constant Intensity capability took what was a variable (intensity and time), replacing them with fixed intensity and time.

Paper Details

Date Published: 20 September 1976
PDF: 7 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954826
Show Author Affiliations
Gerald Bachur, Optical Associates, Inc. (United States)


Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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