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Proceedings Paper

Application Of Plasmas To Semiconductor Materials And Fabrication
Author(s): John Hollahan; James Mitzel
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Paper Abstract

The use of plasmas -- low temperature gas discharges -- for semiconductor materials fabrication or processing is gaining widespread acceptance in the industry. This review will focus on the high application areas in micro-electronics for plasmas. These include photoresist removal, various substrate "cleaning" applications, etching of passivation layers, and thin film deposition.

Paper Details

Date Published: 1 March 1974
PDF: 6 pages
Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954257
Show Author Affiliations
John Hollahan, Tegal Corp. (United States)
James Mitzel, Tegal Corp. (United States)


Published in SPIE Proceedings Vol. 0055:
Technological Advances in Micro and Submicro Photofabrication Imagery
William Converse; J. M. Graf, Editor(s)

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