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Proceedings Paper

Projection Photolithography For Microwave LSI-IC Applications
Author(s): Douglas Ritchie
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Paper Abstract

Projection printing techniques have been developed and applied to the fabrication of fine pattern microwave integrated circuits. This paper deals with details of the applied projection printing tech-nologies through utilization of a commercially available projection printing system with magnification of 1/2. Results are reported for minimum pattern widths of the order of 1 to 2 microns produced in both positive and negative photoresist films on Si02 and metallic substrates. Of particular concern are processing problems peculiar to the reduction projection method as it relates to the fabrication of integrated circuit structures.

Paper Details

Date Published: 1 March 1974
PDF: 8 pages
Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954253
Show Author Affiliations
Douglas Ritchie, Tektronix, Inc. (United States)


Published in SPIE Proceedings Vol. 0055:
Technological Advances in Micro and Submicro Photofabrication Imagery
William Converse; J. M. Graf, Editor(s)

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