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Proceedings Paper

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space
Author(s): Dmitry Vengertsev; Kihyun Kim; Seung-Hune Yang; Seongbo Shim; Seongho Moon; Artem Shamsuarov; Sooryong Lee; Seong-Woon Choi; Jungdal Choi; Ho-Kyu Kang
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Paper Abstract

Model-based Optical Proximity Correction (OPC) is widely used in advanced lithography processes. The OPC model contains an empirical part, which is calibrated by fitting the model with data from test patterns. Therefore, the success of the OPC model strongly relies on a test pattern sampling method. This paper presents a new automatic sampling method for OPC model calibration, using centroid-based clustering in a hybrid space: the direct sum of geometrical sensitivity space and image parameter space. This approach is applied to an example system in order to investigate the minimum size of a sampling set, so that the resulting calibrated model has the error comparable to that of the model built with a larger sampling set. The proposed sampling algorithm is verified for the case of a contact layer of the most recent logic device. Particularly, test patterns with both 1D and 2D geometries are automatically sampled from the layer and then measured at the wafer level. The subsequent model built using this set of test patterns provides high prediction accuracy.

Paper Details

Date Published: 8 November 2012
PDF: 8 pages
Proc. SPIE 8522, Photomask Technology 2012, 85221A (8 November 2012); doi: 10.1117/12.953827
Show Author Affiliations
Dmitry Vengertsev, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kihyun Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seung-Hune Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seongbo Shim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seongho Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Artem Shamsuarov, Graphics Solution Group (Russian Federation)
Sooryong Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Woon Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungdal Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ho-Kyu Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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