Share Email Print

Proceedings Paper

An Experimental Determination of the Optical Lithographic Requirements for Sub-Micron Projection Printing
Author(s): John S. Petersen
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

New optical lithographic technologies for 16 Megabit DRAM mass production will be required to generate workable 0.5 to 0.6 micron geometries for several of the device's levels. This is because current stepper and resist technology, while capable of resolving in this range of geometries, can not adequately do mass production processing at these levels due to optical limitations. These limitations have been described via the Rayleigh equation: W = k1 λ/NA

Paper Details

Date Published: 25 July 1989
PDF: 28 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953182
Show Author Affiliations
John S. Petersen, Shipley Microelectronics Ltd. (Japan)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

© SPIE. Terms of Use
Back to Top