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Proceedings Paper

Broadband Deep-UV High NA Photolithography System
Author(s): Bruce Ruff; Elizabeth Tai; Robert Brown
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Paper Abstract

We have constructed and tested a lens for use with deep ultraviolet photolithography systems. This broadband lens may be used with a mercury arc lamp as the illumination source. It is found that this system is an economically sound approach to the implementation of sub-half micron photolithography

Paper Details

Date Published: 25 July 1989
PDF: 7 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953173
Show Author Affiliations
Bruce Ruff, Ultratech Stepper (United States)
Elizabeth Tai, Ultratech Stepper (United States)
Robert Brown, Ultratech Stepper (United States)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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