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Proceedings Paper

Step And Scan: A Systems Overview Of A New Lithography Tool
Author(s): Jere D. Buckley; Charles Karatzas
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Paper Abstract

The Micrascan I system, a new 0.5-micron lithography tool, employs a 'step-and-scans concept that combines the virtues of ring-field scanning systems with those of conventional step-and-repeat systems. Individual exposure fields on the wafer are sequentially scanned past the arcuate image field of a catadioptric projection optics system with a 4:1 reduction ratio. The reticle is scanned in precisely coordinated fashion by a separate stage. Exposure illumination is provided by a long-life mercury-xenon arc lamp. The concept enables very large field sizes and high system productivity.

Paper Details

Date Published: 25 July 1989
PDF: 10 pages
Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); doi: 10.1117/12.953171
Show Author Affiliations
Jere D. Buckley, The Perkin-Elmer Corporation (United States)
Charles Karatzas, The Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 1088:
Optical/Laser Microlithography II
Burn Jeng Lin, Editor(s)

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